发明名称 Semiconductor wafer alignment apparatus
摘要 An apparatus for treating a wafer of semiconductor material so that individual devices which may be simple devices or complete complex integrated circuits defined on the front surface of the wafer can be easily separated from the wafer. The apparatus aligns the wafer to a fixed reference position, inverts the aligned wafer to expose its backside and transfers it with controlled motion to a set position under a laser beam apparatus. The laser beam scans the backside of the wafer to create in the kerf area between each of the devices an easily fractured region. While maintaining the wafer alignment the laser treated wafer may be transferred to a flexible pressure sensitive tape tensioned across the frame which maintains the wafer alignment. The wafer, while on the frame can be tested, fractured into respective individual devices, and selectively removed from the tape.
申请公布号 US4046985(A) 申请公布日期 1977.09.06
申请号 US19740526989 申请日期 1974.11.25
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 GATES, GERALD ALAN
分类号 G03F9/00;H01L21/68;(IPC1-7):B23K26/00 主分类号 G03F9/00
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