发明名称 |
VERFAHREN ZUR HERSTELLUNG DUENNER MAGNETISCHER SILICIUMEISENSCHICHTEN |
摘要 |
Iron-silicon is sputtered onto a substrate to be used for a magnetic recording head from a target containing 4% to 7% of silicon with a substrate bias between -2.5 and -60 volts, anode-cathode spacing of about 1/2 to about 2 inches, a deposition rate of greater than 150A/min, a substrate temperature above 250 DEG C, an argon pressure above 10 microns, and a single film thickness greater than 0.4 micron, a laminated film thickness greater than 0.05 micron, and R.F. input power above 8 watts/in2. |
申请公布号 |
DE2707692(A1) |
申请公布日期 |
1977.09.01 |
申请号 |
DE19772707692 |
申请日期 |
1977.02.23 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORP. |
发明人 |
GEORGE AINSLIE,NORMAN;DOUGLAS HEMPSTEAD,ROBERT;TAN,SWIE-IN;PHILIPP VALSTYN,ERICH |
分类号 |
C22C38/00;C23C14/40;G11B5/147;G11B5/31;H01F10/14;H01F41/14;H01F41/18;(IPC1-7):C23C15/00 |
主分类号 |
C22C38/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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