APPARATUS FOR SYNTHETIC DIAMOND DEPOSITION INCLUDING SPRING-TENSIONED FILAMENTS AND SUBSTRATE COOLING MEANS

摘要

RD-19385 APPARATUS FOR SYNTHETIC DIAMOND DEPOSITION INCLUDING SPRING-TENSIONED FILAMENTS AND SUBSTRATE COOLING MEANS Diamond is deposited by chemical vapor deposition on two parallel substrates, by means of a plurality of filaments between said substrates. The substrates and filaments are in vertical configuration and the filaments are linear and spring-tensioned to compensate for thermal expansion and expansion caused by filament carburization. The apparatus includes at least one and preferably two heat sinks to maintain substrate temperature in the range of 9001000.degree.C, for optimum rate of diamond deposition.