| 发明名称 |
Method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer |
| 摘要 |
This invention pertains to a method of transferring a surface relief pattern from a poly(olefin sulfone) layer to a metal layer wherein the poly(olefin sulfone) layer is exposed to ultra violet radiation prior to sputter etching the surface relief pattern into the metal layer.
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| 申请公布号 |
US4045318(A) |
申请公布日期 |
1977.08.30 |
| 申请号 |
US19760710184 |
申请日期 |
1976.07.30 |
| 申请人 |
RCA CORPORATION |
发明人 |
HIMICS, RICHARD JOSEPH;DESAI, NITIN VITHALBHAI;POLINIAK, EUGENE SAMUEL |
| 分类号 |
C23C14/35;C23F4/00;G03F7/00;(IPC1-7):C23C15/00 |
主分类号 |
C23C14/35 |
| 代理机构 |
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