发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
<p>PURPOSE:To make an aperture of CDV oxidation film with good yielding on an element in IC formed on an insulated substrate.</p> |
申请公布号 |
JPS52101967(A) |
申请公布日期 |
1977.08.26 |
申请号 |
JP19760017911 |
申请日期 |
1976.02.23 |
申请人 |
KOGYO GIJUTSUIN |
发明人 |
KIMURA MINORU;TANGO KOUSUKE;OOMORI YUKIO |
分类号 |
H01L29/78;H01L21/268;H01L21/301;H01L21/304;H01L21/306;H01L21/78;H01L21/86;H01L23/544;H01L27/12;H01L29/786 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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