摘要 |
A method for the production of films having the desired geometrical form (configuration) comprising depositing an electromagnetic radiation-sensitive system, which consists of a metal layer and an inorganic compound layer capable of reacting with said metal layer and forming interaction products under the effect of electromagnetic radiation, onto a film made from a material which does not react, on being irradiated, with the layer of said system that adjoins said film; subjecting said system to selective irradiation in conformity to the desired configuration, followed by carrying out the selective etching of the irradiated system so as to obtain the requisite configuration, and thereafter using said etched system as a mask for etching selectively said film in order to impart thereto the sought-for geometrical form.
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申请人 |
VOITOVICH, IGOR DANILOVICH;KOSTYSHIN, MAXIM TIMOFEEVICH;MIKHAILOVSKAYA, EKATERINA VASILIEVNA;PETROV, VYACHESLAV VASILIEVICH;ROMANENKO, PETR FEDOROVICH;SKURIDIN, VLADIMIR PETROVICH |
发明人 |
VOITOVICH, IGOR DANILOVICH;KOSTYSHIN, MAXIM TIMOFEEVICH;MIKHAILOVSKAYA, EKATERINA VASILIEVNA;PETROV, VYACHESLAV VASILIEVICH;ROMANENKO, PETR FEDOROVICH;SKURIDIN, VLADIMIR PETROVICH |