| 发明名称 |
POLYMER MATERIALS FOR ELECTRONIC IRRADIATION RESIST |
| 摘要 |
PURPOSE:To use a specific (co) polymer of methacrylate so that the resist may show high sensitivity and sharp suceptibility of decomposition under electronic irradiation and a highsensitivity positive picture obtained after development process with an organic solvent. |
| 申请公布号 |
JPS5293332(A) |
申请公布日期 |
1977.08.05 |
| 申请号 |
JP19760010130 |
申请日期 |
1976.02.02 |
| 申请人 |
KOGYO GIJUTSUIN |
发明人 |
FUJISHIGE NORINAGA;ICHIKAWA SUSUMU |
| 分类号 |
C08F220/00;C08F20/18;C08F220/10;G03C1/72;G03F7/039;G03G5/00;H01L21/027;H01L21/312;H01L21/47;H05K3/00 |
主分类号 |
C08F220/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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