| 摘要 |
<p>Development of both diazo- and vesicular-copy films in a single appts. in which an exposed copy sheet is advanced through a closed chamber, by (a) subjecting the exposed copy sheet in the chamber to the action of a first temp. exceeding ambient temp. in the use of a vesicular material. (b) in the use of a diazomaterial, producing a developing vapour in the chamber, at an elevated temp. lower than the first temp. (c) operating the appts. selectively for development of diazo- or vesicular-material, whereby the development of diazomaterial, the heating means is taken out of operation and a diazo copy sheet is only subjected to the action of the developing vapour at the said elevated temp. for developing the diazo copy sheet. (d) in the use of a vesicular material, taking the appts. producing the developing vapour out of action and subjecting the vesicular copy sheet to the action of heat only at the first temp. for its development. Provides for the first time a means of developing both diazo- and vesicular copy films using the same apparatus. It is esp. useful in the reproduction of micro-originals.</p> |
