发明名称 Verfahren zur Herstellung von elektrischen Duennschichtwiderstaenden
摘要 1,069,941. Oxide film resistors. SOCIETE D'ELECTRONIQUE ET D'AUTOMATISME. May 20, 1965 [June 2, 1964], No. 21W/65. Headings H1K and H1S. A resistor comprises a film of tin oxide doped with P-type impurity deposited on a dielectric substrate. The P-type impurity compensates for the N-type semi-conductivity of the tin oxide. The resistor is produced by atomizing a mixture of solutions containing tin chloride and aluminium chloride so that the mist passes up inside an oven on to the substrate where it is pyrolized into tin oxide. Indium, gallium and boron are also mentioned as preferred impurities.
申请公布号 DE1540419(A1) 申请公布日期 1970.03.05
申请号 DE19651540419 申请日期 1965.05.20
申请人 COMPAGNIE INTERNATIONALE POUR L'INFORMATIQUE 发明人 ALAIN DREYFUS,BERTRAND
分类号 H01B1/00;H01C17/20 主分类号 H01B1/00
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