发明名称 Verfahren zum Herstellen von Halbleiterbauelementen
摘要 1,107,009. Semi-conductor devices. STANDARD TELEPHONES & CABLES Ltd. 22 Nov., 1966, No. 52154/66. Heading H1K. The junction 8 between opposite conductivity-type regions 2, 5 of a semi-conductor device, the former of which regions surrounds the latter, extends perpendicularly to the surface of, and down to, a gallium arsenide substrate 1 on which the device is formed. In the embodiment shown the N-type region 2 is formed either by epitaxial deposition of gallium arsenide, gallium phosphide or germanium on to the semi-insulating substrate 1, or by conversion of the surface of the substrate to N-type semiconductivity. The P-type region 5 is then formed by diffusion through a suitable silicon oxide mask 3, and ohmic contacts 6, 7 are applied to the P and N regions, respectively to form a diode. The region 5 may alternatively be formed by alloying a suitable dopant into the region 2. In a further embodiment a shaft is etched in the region 2 down to the substrate 1 through the oxide mask, and the second region is formed by diffusion into the exposed surface of the region 2, to form an annular P-type zone (13), Fig. 4c (not shown). The shaft is then filled with conducting material to form ohmic contact to the zone (13), annular contact to the N-type first region (2) being made as above. The annular P-type zone may alternatively be formed by the alloying of a dopant which is inserted into the etched shaft. A transistor may be made by diffusing a P-type region 5 into the N-type region 2 as described above, and subsequently diffusing a further N-type region (13), Fig. 6j (not shown), into the region (5) through a suitable mask, to form a second junction perpendicular to the surface and extending down to the substrate (1), and surrounded by the first junction. A limited P-type diffusion stage may then be used to increase the surface area of a portion of the region (5), to facilitate the application of an ohmic base contact (17), emitter and collector contacts (18, 16) also being applied to the regions (13, 2) respectively.
申请公布号 DE1589703(A1) 申请公布日期 1970.03.26
申请号 DE19671589703 申请日期 1967.11.11
申请人 DEUTSCHE ITT INDUSTRIES GMBH 发明人 HUBERT MASH,DEREK;ROWLAND PETERS,JACK
分类号 H01L21/00;H01L21/18;H01L21/20;H01L21/228;H01L27/00;H01L29/00;H01L29/207;H01L29/86 主分类号 H01L21/00
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