发明名称 PROCEDIMENTO E DISPOSITIVO PER L INTRODUZIONE PRESTABILITA DI SOSTANZE DI DROGAGGIO IN CRISTAL LI DI MATERIALE SEMICONDUTTORE DURANTE LA FUSIONE A ZONE PROGRES SIVE SENZA OROGIUOLO
摘要 A method and apparatus for positively introducing dopants into semiconductor crystals via crucible-free zone melting whereby a polycrystalline rod is mounted at opposite ends thereof in a housing which includes an annular induction heating coil surrounding a section of the rod for producing a melt zone at such section and a thin dopant source rod having a predetermined amount of dopant therein is controllably fed into the melt zone so that a positively determinable amount of dopant is provided in the recrystallized rod.
申请公布号 IT1017430(B) 申请公布日期 1977.07.20
申请号 IT19740025551 申请日期 1974.07.24
申请人 SIEMENS AG 发明人
分类号 C30B13/10;H01L21/208;(IPC1-7):01J/ 主分类号 C30B13/10
代理机构 代理人
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