发明名称 |
PROCEDIMENTO E DISPOSITIVO PER L INTRODUZIONE PRESTABILITA DI SOSTANZE DI DROGAGGIO IN CRISTAL LI DI MATERIALE SEMICONDUTTORE DURANTE LA FUSIONE A ZONE PROGRES SIVE SENZA OROGIUOLO |
摘要 |
A method and apparatus for positively introducing dopants into semiconductor crystals via crucible-free zone melting whereby a polycrystalline rod is mounted at opposite ends thereof in a housing which includes an annular induction heating coil surrounding a section of the rod for producing a melt zone at such section and a thin dopant source rod having a predetermined amount of dopant therein is controllably fed into the melt zone so that a positively determinable amount of dopant is provided in the recrystallized rod. |
申请公布号 |
IT1017430(B) |
申请公布日期 |
1977.07.20 |
申请号 |
IT19740025551 |
申请日期 |
1974.07.24 |
申请人 |
SIEMENS AG |
发明人 |
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分类号 |
C30B13/10;H01L21/208;(IPC1-7):01J/ |
主分类号 |
C30B13/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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