| 发明名称 |
FORMATION METHOD OF HIGH MOLECULAR FILM PATTERNS BY HIGH ENERGY BEAMS |
| 摘要 |
PURPOSE:To form high molecular film patterns of high resolution and high sensitivity to high energy beams and high etching resistance by using homopolymer and copolymer as high energy beam resist. |
| 申请公布号 |
JPS5285475(A) |
申请公布日期 |
1977.07.15 |
| 申请号 |
JP19760001624 |
申请日期 |
1976.01.09 |
| 申请人 |
NIPPON TELEGRAPH & TELEPHONE |
发明人 |
IMAMURA SABUROU;SUGAWARA SHIYUNGO;MURASE SATORU |
| 分类号 |
G03F7/004;C08F2/00;C08F2/54;C08F16/00;C08F16/32;G03C1/72;G03F7/038;G11B9/10;H01L21/027;H01L21/302;H05K3/06 |
主分类号 |
G03F7/004 |
| 代理机构 |
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