| 摘要 |
PURPOSE:To make it possible to detect the position of an exposure pattern in a highly precise manner by a method wherein a film, the rugged shape of which changes in accordance with an exposure pattern, is exposed after it has been coated on a substrate, and the rugged state is detected by allowing a tunnel current to flow between the coated film and a metal meedle. CONSTITUTION:A film, the surface of which changes into the rugged shape in accordance with an exposure pattern, is coated on a substrate, the film is exposed, a tunnel current is allowed to flow and scanned between the coated film and a metal needle, and the rugged shape is detected from the quantity of tunnel current. To be more precise, a composite film consisting of an amorphous chalcogenide film and a silver compound film is provided on the silicon substrate, the surface of which is optically polished. Then, the surface of the above-mentioned film is scanned with a platinum probe which is driven by a piezoelectric element under the set voltage using a tunnel current control system. At this time, the fluctuation of the set tunnel current value shows a stable state, and a scanning type tunnel microscopic observation can be made possible on the surface of the composite film. As a result, the position of an exposure pattern can easily be detected. |
