| 摘要 |
PURPOSE:To make it possible to conduct a highly precise instrumentation by a method wherein the alignment condition of a wafer and the alignment marks of a mask, an appropriate gain of all the alignment marks on the wafer are computed individually, and an instrumentation signal is regulated properly. CONSTITUTION:A mask 66, having an accurate alignment mark at a plurality of places, and a wafer 68 having the alignment mark same as the mask 66 are integrally carried by use of a carriage 72. The relative positional relation between the mask 16 and the wafer 68 is detected based on the output of a photoelectric conversion device 70, the amount of inclination theta of the optical axis and the scanning axis of the carriage of a projection optical system is computed, a carriage driving mechanism 77 and control valves 79 and 80 are controlled, and the inclination adjustment and magnification adjustment of the optical axis of the projection optical system 67 and the carriage scanning axis are conducted. To be more precise, the level of signal to detect all alignment marks is adjusted for each place. As a result, the irregularity of signal on the point of instrumentation of the wafer can be made uniform, and the accuracy of instrumentation can also be improved. |
