| 发明名称 |
VAPOR GROWTH PROCESS |
| 摘要 |
PURPOSE:To cause a film having a desired thickness to grow accurately and repeatedly on wafers in a vapor phase by inserting a tube for keeping the wafers at specified intervals. |
| 申请公布号 |
JPS5280777(A) |
申请公布日期 |
1977.07.06 |
| 申请号 |
JP19750157122 |
申请日期 |
1975.12.27 |
| 申请人 |
FUJITSU LTD |
发明人 |
TACHIGAKE ISAO;KUMAKURA SHIYUNJI |
| 分类号 |
C30B25/14;C23C16/44;C23C16/455;H01L21/205 |
主分类号 |
C30B25/14 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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