发明名称 Method for selective plating
摘要 An electro-plating method and apparatus therefor in which a discrete area of plating, such as a stripe about an elongated workpiece can be deposited without the use of separate masking. A plating solution having a depth equal to the length of the stripe desired is floated over a denser, inert, immiscible liquid (such as a liquid fluorocarbon). Workpieces are attached to a carrier which is electrically energized as cathodes and which are positioned vertically such that the area to receive the plated stripe is within the layer of plating solution, the workpieces projecting above the plating solution layer and below into the inert liquid as necessary. Pump weir and sump arrangements provide for maintenance of the plating solution and inert liquid levels and an anode is separately provided.
申请公布号 US4033832(A) 申请公布日期 1977.07.05
申请号 US19760695736 申请日期 1976.06.14
申请人 INTERNATIONAL STANDARD ELECTRIC CORPORATION 发明人 STERLING, HENLEY F.;DRAKE, MILES P.
分类号 C25D5/02;(IPC1-7):C25D5/02;C25D5/08;C25D17/28 主分类号 C25D5/02
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