| 发明名称 |
Solid diffusion dopants for semiconductors and method of making the same |
| 摘要 |
Disclosed is a solid diffusion source for the phosphorus doping of semiconductors, which comprises a substance composed of at least one kind of compound R2O3 selected from the group consisting of Y2O3, La2O3 and Ce2O3 and P2O5 and containing mainly a compound with a chemical formula R2O3.5P2O5.
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| 申请公布号 |
US4033790(A) |
申请公布日期 |
1977.07.05 |
| 申请号 |
US19760709815 |
申请日期 |
1976.07.29 |
| 申请人 |
DENKI KAGAKU KOGYO KABUSHIKI KAISHA |
发明人 |
GUNJIGAKE, KOREAKI;HASEGAWA, MASASHI;OIZUMI, HIROSHI;OGATA, YOSHIO |
| 分类号 |
C30B31/08;C30B31/16;H01L21/22;(IPC1-7):C04B35/40 |
主分类号 |
C30B31/08 |
| 代理机构 |
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