| 摘要 |
Articles containing silicon nitride and/or silicon oxynitride are produced by forming a mix comprising particulate silicon carbide, and particulate silica or clay, forming into the desired shape and heating at 1300 DEG C. to 1700 DEG C. in an atmosphere of nitrogen. If a clay is used aluminium nitride is also formed. Coarser particles than 200 U.S mesh may be used, but do not enter into the reaction. Carbon may replace part of the silicon carbide, and catlysts, e.g. calcium fluoride, for silicon nitride production may be employed. Dextrin may be added to the mix to act as a temporary bond. |
