| 发明名称 |
REPAIRING METHOD FOR SEMICONDUCTOR MEMORY ELEMENTS |
| 摘要 |
<p>PURPOSE:To repair the defective parts of elements on the same substrate by preparing a mask for one element, and using negative photoresist for photoresist mask flaws and positive photoresist for metal wiring disconnection.</p> |
| 申请公布号 |
JPS5279678(A) |
申请公布日期 |
1977.07.04 |
| 申请号 |
JP19750154704 |
申请日期 |
1975.12.26 |
| 申请人 |
FUJITSU LTD |
发明人 |
ABE SHIGEHARU;SUDA SATOSHI;TAMURA HIDEO |
| 分类号 |
H01L21/3205;G03F1/00;G03F1/08;H01L21/027;H01L21/302;H01L23/52 |
主分类号 |
H01L21/3205 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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