| 发明名称 |
METHOD AND EQUIPMENT OF MASKING |
| 摘要 |
PURPOSE:To gain the fine pattern shape and to improve the sensitivity of photoresist by exposing the light to the heated photo resist spreaded on the semiconductive substrate. |
| 申请公布号 |
JPS5277671(A) |
申请公布日期 |
1977.06.30 |
| 申请号 |
JP19750154448 |
申请日期 |
1975.12.24 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
JINNO KIYOKATSU |
| 分类号 |
H01L21/027;G03F7/20;H01L21/66 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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