| 摘要 |
<p>A lattice or grid metal layer is made by providing a matrix carrier in which, contrary to the prior art, the areas to form the solid portions of the lattice are depressed into the matrix body and, thereafter, the depressions are filled in with a metal by electrolytic deposition, from which the grid structure can then be prepared, the regions or zones between the metal fillings, and to form those zones which will be the interstices of the grid or lattice, are covered by electrically non-conductive material. Grinding or polishing steps may also be used to form a uniform, smooth surface from which the grid or lattice structure can be, electrolytically, prepared.</p> |
