| 摘要 |
In the method for the removal of alkalies from glass surfaces and articles by reaction with hydrofluoric acid, the glass surface is contacted with a gas stream containing a compound of fluorine and silicium, preferably silicium tetrafluoride, and water in a predetermined ratio, the treatment being carried out at high temperature. Depending on the treatment conditions, a deposition of finely divided silica onto the glass surface under treatment can be obtained. |
