发明名称 High aspect ratio P-N junctions by the thermal gradient zone melting technique
摘要 A thermal gradient zone melting technique is employed to migrate an array of metal buttons through a body of semiconductor material to form high aspect ratio P-N junctions therein. Semiconductor devices embodying such P-N junctions are suitable for employment in X-ray and infrared detection and imaging. Each button preferably has the configuration of an equilateral triangle and the array preferably has a hexagonal configuration.
申请公布号 US4030116(A) 申请公布日期 1977.06.14
申请号 US19750577999 申请日期 1975.05.16
申请人 GENERAL ELECTRIC COMPANY 发明人 BLUMENFELD, SAMUEL M.
分类号 C30B13/02;C30B13/06;H01L21/24;H01L31/00;(IPC1-7):H01L29/06;H01L29/04 主分类号 C30B13/02
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