发明名称 VERFAHREN ZUM HERSTELLEN VON AUS SILICIUM ODER SILICIUMCARBID BESTEHENDEN, DIREKT-BEHEIZBAREN ROHREN
摘要 Directly heatable tubular semiconductor bodies are produced by pyrolytically depositing a continuous layer of silicon or silicon carbide from a thermally decomposable silicon compound onto a heated graphite mandrel, non-destructively removing the so-deposited tubular body from the mandrel, applying a dopant-containing lacquer or the like onto select outer surface portions of such tubular body and subjecting the so-coated tubular body to diffusion conditions sufficient to dope the select outer body portions of the body and render such body directly heatable via an applied electrical current.
申请公布号 DE2554399(A1) 申请公布日期 1977.06.08
申请号 DE19752554399 申请日期 1975.12.03
申请人 SIEMENS AG 发明人 DIETZE,WOLFGANG,DIPL.-CHEM.DR.
分类号 C01B33/02;C01B33/035;C23C16/01;C23C16/22;C23C18/12;C30B31/10;C30B31/12;(IPC1-7):01J17/34;01J17/32 主分类号 C01B33/02
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