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发明名称
Verfahren zum Herstellen von diffundierten Halbleiterbauelementen aus Silicium
摘要
申请公布号
CH519788(A)
申请公布日期
1972.02.29
申请号
CH19690018694
申请日期
1969.12.16
申请人
SIEMENS AKTIENGESELLSCHAFT
发明人
WOELFLE,RUDOLF,DIPL.-PHYS.;DR. RUECKER,DIETER,DIPL.-PHYS.;LAUERER,UTA
分类号
H01L29/73;C30B31/02;H01L21/225;H01L21/288;H01L21/331;(IPC1-7):H01L7/34
主分类号
H01L29/73
代理机构
代理人
主权项
地址
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