| 摘要 |
PURPOSE:To know an end point of etching by forming a film by mixing substance to be etched such as Cr with an inert substance which does contribute to etching reaction, thereby measuring a luminous spectrum luminance intrinsic to said inert substance at the time of dry etching. CONSTITUTION:Cr 2 is adhered to a glass substrate 1 through high-frequency heating in an ambience N2 and a large quantity of N is mixed into said Cr. The Cr is etched in the ambience without N using a gas mixture of CCl4 and O2. As etching goes on, the amount of N2 in the reaction receptacle 3 increases and its luminous spectrum luminance also increases. When it approaches the etching end point, the etched area is reduced in proportion to the time elapsed and the luminance decreases partly in accordance with a function of time. After ending etching, the remaining N2 is discharged in the reaction chamber 3 and the luminance decreases exponentially. Thus, the etching end point is supposed to be the point 15. When etching is ended at the point 15 on the luminance curve recorded through a spectrum analyzer 10, the desired pattern is obtained with a better reproducibility. |
