METHOD OF FORMING RESIST PATTERN AND METHOD OF MAKING ION ABSORPTION MASK USED THEREFOR,申请号JP19760128903-传众专利搜索

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发明名称	METHOD OF FORMING RESIST PATTERN AND METHOD OF MAKING ION ABSORPTION MASK USED THEREFOR
摘要
申请公布号	JPS5255382(A)	申请公布日期	1977.05.06
申请号	JP19760128903	申请日期	1976.10.28
申请人	HUGHES AIRCRAFT CO	发明人	ROBAATO ERU SERIGAA
分类号	G03F7/20;H01L21/027	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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