发明名称 Apparatus for crystal growth
摘要 In order to eliminate non-uniformity in the temperature within the plane of a substrate that causes dispersions or variations in the characteristics of a grown layer during liquid phase epitaxial growth and to produce a grown layer having uniform characteristics, an apparatus for crystal growth according to the invention holds a substrate on a jig so that a flat surface of the substrate is arranged tangentially to an isothermal plane within the jig and aslant with respect to any position perpendicular or parallel to the axis or the center plane of the jig. Where a multiplicity of substrates are set, they are held on at least two flat surfaces which are tangential to an identical isothermal plane and which have different slopes.
申请公布号 US4016829(A) 申请公布日期 1977.04.12
申请号 US19740445898 申请日期 1974.02.26
申请人 HITACHI, LTD. 发明人 ITO, KAZUHIRO;ONO, YUICHI;UEYANAGI, KIICHI;MORIOKA, MAKOTO;KAWAMURA, MASAO
分类号 C30B19/06;C30B19/08;C30B29/40;H01L21/208;(IPC1-7):B01J17/04 主分类号 C30B19/06
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