| 发明名称 |
METHOD OF FORMING FINE PATTERN |
| 摘要 |
PURPOSE:To provide corrosion resistance to a photoresist film by ion implantation thereby performing etching of a fine pattern. |
| 申请公布号 |
JPS5244571(A) |
申请公布日期 |
1977.04.07 |
| 申请号 |
JP19750120962 |
申请日期 |
1975.10.06 |
| 申请人 |
NIPPON ELECTRIC CO |
发明人 |
HASHIMOTO TADAHIRO;OKUYAMA YASUSHI |
| 分类号 |
H01L21/302;G03F7/40;H01L21/027;H01L21/306 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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