| 摘要 |
<p>1426890 Photopolymerizable materials MINNESOTA MINING & MFG CO 19 Nov 1973 [20 Nov 1972] 53665/73 Heading G2C [Also in Division C3] Positive or negative working photopolymerizable elements comprise a substrate bearing a light-sensitive layer of a composition comprising (1) at least one free radical polymerizable monomer having at least one ethylenically unsaturated terminal group and a boiling point above 100‹C (2) at least one photoinitiator in an amount sufficient to polymerize the monomer(s) upon exposure to actinic radiation, and (3) a blend comprising (a) at least one acid-soluble amino-containing polymer and (b) at least one compatible, acidinsoluble, film-forming polymer. The compositions may additionally include such additives as pigments and sensitizers. After exposure, positive development can be achieved with dilute acid, e.g. 2-5% aqueous acetic acid; alternatively negative development is effected by treating with a dilute base, e.g. 0.1% ammonia solution. In Examples the amino polymer is selected from poly(2- dimethylaminoethyl methacrylate), poly(2- diethylaminoethyl methacrylate), poly(3-dimethylaminopropyl methacrylate), poly(11-dimethylaminoundecyl methacrylate), and copolymers of 2-dimethylaminoethyl methacrylate with isoarryl acrylate, lauryl methacrylate or tetrahydrofurfuryl methacrylate; and the acid-insoluble polymer is selected from polyvinyl acetate having pendant carboxyl groups, polyvinyl formal, hydroxypropylcellulose, diacetone acrylamide/formaldehyde condensation product and vinylpyrrolidone/methyl methacrylate copolymer. Applications include silk screen printing of Fig. 3 (not shown) printed cir cuits and lithographic plates. The p/p composition may be coated on a polyester support subbed with a polyvinyl alcohol or any watersoluble polymer and be covered with a film (e.g. polyethylene) which can be removed so that the p/p layer can be applied to a silk screen and the support peeled off so it can be used in silk screen printing.</p> |
