Method of making resistive films,申请号US19740433892-传众专利搜索

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发明名称	Method of making resistive films
摘要	A resistive film composition consisting essentially of AlN and solid solution of TiN and ZrN and a method of making the same by means of cathodic sputtering.
申请公布号	US4016061(A)	申请公布日期	1977.04.05
申请号	US19740433892	申请日期	1974.01.16
申请人	MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.	发明人	WASA, KIYOTAKA;HOSOMI, FUMIO;HAYAKAWA, SHIGERU
分类号	C23C14/00;C23C14/06;H01B1/00;H01C17/12;H01J37/34;(IPC1-7):C23C15/00	主分类号	C23C14/00
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