发明名称 Storage matrix with single transistor memory elements - has FET with U-shaped drain electrode and connections to storage capacitor and bit line
摘要 <p>The single transistor memory element has a drain (30) source (20) and gate (40) electrodes. The bit line conductor (10) is connected to gate electrode, and the source (20) is a doped region mounted on a silicon substrate of p-type conductivity. The drain electrode has a U-shaped profile and its dimensions are such that in normal operation no electrical connection can be made with the doped source region. Meander-shaped connections are used to form a matrix array out of the single unit elements. An insulating film is provided between gate electrode (40) of the FET and the gate electrode (50) of a storage capacitor. A number of parallel word-lines are provided, each alterante line have a connection to the FET associated with one bit line and the intermediate word-lines associated with the others.</p>
申请公布号 DE2553591(B1) 申请公布日期 1977.03.31
申请号 DE19752553591 申请日期 1975.11.28
申请人 SIEMENS AG 发明人 TIHANYI JENOE DIPL-PHYS;MEUSBURGER GUENTHER DIPL-ING
分类号 G11C11/404;G11C11/4097;H01L27/07;H01L27/108;(IPC1-7):G11C11/24;H01L27/10 主分类号 G11C11/404
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