| 摘要 |
1468747 Composite photography ENERGY CONVERSION DEVICES Ltd 10 April 1974 [12 April 1973] 36161/76 Divided out of 1468746 Heading G2X A method of making composite images which comprises exposing to a first pattern a material comprising a support, an opaque layer and a positive photo-resist, developing to remove the areas of opaque material underlying the exposed areas of the photo-resist and normally the exposed photoresist areas as well, and then exposing to a second pattern and developing to produce the composite image. The method is generally used for microfilm using transparent supports but may be used for lithography using aluminium supports. Preferred opaque layers are Te or compositions containing at least 50 per cent Te but layers of Mb, Po, Co, Zn, Al, Cu, Ni, Fe, Sn, V, Ge or Ag may be used. Materials which have opaque layers and positive photo-resist layers on both sides of the support which may be used to produce images which may subsequently be added to are disclosed in Specification 1468746. |
