发明名称 SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE:To reduce the degree of erasing of a mask and the like by a method wherein the mask and the like is put on the surface of a package, and a film through which the mark and the like can be visually observed is provided thereon. CONSTITUTION:A recessed part 3 is formed on the upper surface f the package 2 of an IC 1. The size of the recessed part 3, its area in other words, is provided freely according to the size and number of letter, marks and th like. The mark, type and the like are impressed on the surface of the recessed part 3 using silver ink. Besides, the film of transparent resin 4 is coated on the above- mentioned surface. As a result, the degree of erasing of the letter, marks and the like can be reduced.</p>
申请公布号 JPS62169448(A) 申请公布日期 1987.07.25
申请号 JP19860010106 申请日期 1986.01.22
申请人 HITACHI TOKYO ELECTRON CO LTD;HITACHI LTD 发明人 HIROMASA FUMIO;NAKADA FUMIO;MATSUMOTO YOSHIKI
分类号 H01L21/02;H01L23/00;H01L23/544 主分类号 H01L21/02
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