AUTOMATIC ETCHER FOR OFFSET MASTER

摘要

Apparatus for automatically applying etching solution to the surface of an offset master. The master is secured to the surface of a master cylinder. Etching solution is contained in an enlongated reservoir parallel to the master cylinder. A foam rubber feed roller is partially immersed in the etching solution and has a squeegee roller in contact with it. The feed roller is caused to step sequentially through three positions: a "rest" position in which it is withdrawn from the master cylinder and at rest with squeegee roller pressure relieved; a "make ready" position wherein it is rotating with the the squeegee roller bearing on it but still withdrawn from the master cylinder; and an "etch" position wherein it is in scrubbing contact with the master cylinder and rotating in the same direction as the master cylinder.