Plasma-chemical reactor for treatment of disperse materials

摘要

A plasma-chemical reactor for treatment of disperse materials comprises a vertical working chamber. The top portion of the working chamber includes means to feed the disperse material into the reactor. The working chamber is provided with means for feeding and plasma-heating process gas, said means being a number of plasmatrons the nozzles of which are arranged along the periphery of the working chamber bottom portion and directed essentially at a right angle to the working chamber vertical axis. The reactor also includes means for evacuating gaseous products from the working chamber and a bin located under the working chamber and communicating with the bottom portion thereof.