METAL OXIDE COATINGS

摘要

1446848 Sputtering apparatus TRIPLEX SAFETY GLASS CO Ltd 28 Nov 1973 [29 Nov 1972] 55156/72 Heading C7F In a process for reactively sputtering a metal oxide film using parallel spaced, hollow strips 271 of e.g. In-Sn alloy which are moved relatively to the substrate 31 by cables 48, as described in Specification 1365492, the thickness of the film over different parts of the substrate is controlled by varying the effective width of the cathodes, either by masks 26, Fig. 4, which may also be in the form of adjustable sections Fig. 5 (not shown) or by making each strip of different width from one . end to the other. The substrate and cathodes may be correspondingly curved. The substrate may be heated (240 to 400‹C) by a radiant heater 54, and the temperature may be controlled automatically. The spaces between the strip cathodes allows free circulation of the sputtering gas, e.g. oxygen-argon mixture.