发明名称 MOSFET antiparasitic layer
摘要 A semiconductor device which is provided, for the purpose of eliminating parasitic MOSFETs formed between at least two circuit elements (such as MOSFET, TRANSISTOR, RESISTOR, and the like) on a semiconductor substrate, with a high impurity concentration layer of the same conduction type as the substrate in a manner such that the layer is not only in the semiconductor substrate between said circuit elements but is also partially overlapped by the circuit element regions.
申请公布号 US4011581(A) 申请公布日期 1977.03.08
申请号 US19700068973 申请日期 1970.09.02
申请人 HITACHI, LTD. 发明人 KUBO, MASAHARU;NAGATA, MINORU;KOSA, YASUNOBU
分类号 H01L29/78;H01L21/76;H01L23/29;H01L27/02;H01L27/092;H01L29/00;H01L29/06;(IPC1-7):H01L29/78;H01L27/04 主分类号 H01L29/78
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