| 发明名称 |
PHOTO MASK PROCESSING SYSTEM AND ITS DEVICE |
| 摘要 |
PURPOSE:The defective parts of metal film are completely eliminated as well as roughness of glass substrate of corrected plane is minimized with automated elimination and correction. |
| 申请公布号 |
JPS5227372(A) |
申请公布日期 |
1977.03.01 |
| 申请号 |
JP19750103031 |
申请日期 |
1975.08.27 |
| 申请人 |
HITACHI LTD |
发明人 |
HONGOU MIKIO;NAKABAYASHI JIYUNICHI |
| 分类号 |
H01L21/027;B23K26/08;G03F1/00;G03F1/72;H05K3/00;H05K3/02;H05K3/22 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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