| 摘要 |
PURPOSE:To enhance sensitivity and resolution by constituting a resist material which can form patterns by far UV rays, etc., of a compd. contg. 1, 2- naphthoquinone diazide-4-sulfonate having an alkali-soluble phenolic hydroxyl group and specified absorbance. CONSTITUTION:For example, the condensation reaction product of phenols and aldehydes, the condensation reaction product of phenols and ketones, a vinyl phenol polymer, isopropenyl phenol polymer, etc., are used as the alkali- soluble phenolic resin. A photosensitive agent suppress the solubility of the alkali-soluble phenolic resin in a developing soln. and is modified by photoirradiation to have the effect being accelerated in the solubility in the developing soln. More specifically, the 1, 2-naphthoquinone diazide-4-sulfonate having the phenolic hydroxy group and <=0.01 absorbance per 1ppm at 248 to 251nm is used. |
