发明名称 PHOTO RESIST PROCESSING APPARATUS
摘要 PURPOSE:To obtain a photo resist processing equipment, through which stabilized and consistent processing can be ensured, continuous processing for different lots of various types is possible, and good yield is secured for photo resist processing.
申请公布号 JPS5227367(A) 申请公布日期 1977.03.01
申请号 JP19750102971 申请日期 1975.08.27
申请人 HITACHI LTD 发明人 SUZUKI JIYUN;MAEJIMA HIROSHI;NAGATOMO HIROTO;KANETANI MUTSUYO
分类号 H01L21/027;G03F7/26;H01L21/30;H01L21/302 主分类号 H01L21/027
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