发明名称 Lith-type silver halide photosensitive material containing a p-benzoquinone derivative
摘要 An improved silver halide photosensitive material of the lith-type is disclosed which is suitable for an infectious development in order to obtain high contrast images with high sensitivity. A method for developing the material is also disclosed. The material comprises silver halide grains containing at least 50 mole per cent of silver chloride, less than 40 mole per cent of silver bromide and less than 5 mole percent of silver iodide based on total silver halide, the average size of the grains being 0.05 to 0.5 microns in diameter. The material further comprises a compound represented by the following general formula I or II <IMAGE> I <IMAGE> II wherein R is alkyl, aryl, aralkyl or acyl; R' is hydrogen or -OR; and R'' is hydrogen or acyl.
申请公布号 US4010036(A) 申请公布日期 1977.03.01
申请号 US19750579792 申请日期 1975.05.22
申请人 KONISHIROKU PHOTO INDUSTRY CO., LTD. 发明人 SUGA, TSUNEO;KISHI, KEN-ICHI;KOREMATSU, SHINOBU;KANBE, MASARU;TAKAHASHI, TOSHIAKI
分类号 G03C1/06;(IPC1-7):G03C1/06;G03C1/28;G03C5/30 主分类号 G03C1/06
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