| 摘要 |
A method for exposure of patterns described in one or several databases containing geometrical descriptions of said patterns by means of writing with a focussed laser light onto substrates which are photosensitive at the wavelength of the laser light, comprising the steps of moving the substrate during the writing procedure in a first direction (y) relative to a fixed frame, continuously moving the optics focussing laser light on said photosensitive surface in a second direction (x) essentially perpendicular to the first direction, spreading the focussed laser light on the photosensitive surface in the first direction (y) for forming an extended focus area, and independently controlling the focussed laser light hitting more than 100 position increments spaced in the first direction (y) across the extended focus area.
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