| 发明名称 |
PERFECCIONAMIENTOS INTRODUCIDOS EN ESTRUCTURAS DE CAPA DE RESERVA DE ALTA SENSIBILIDAD PARA EXPOSICION A RADICACIONES DE ALTA ENERGIA. |
| 摘要 |
A high sensitivity resist layer structure for high energy radiation exposure is formed by coating plural layers of radiation degradable polymers on a substrate which layers are successively slower dissolving in the resist developer. Upon exposure and solvent development, a resist edge profile is obtained which is particularly useful for metal lift-off. |
| 申请公布号 |
ES433048(A1) |
申请公布日期 |
1977.03.01 |
| 申请号 |
ES19740433048 |
申请日期 |
1974.12.18 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
|
| 分类号 |
G03F7/039;G03F1/68;G03F7/095;G03F7/26;H01L21/027;H01L21/3205;H05K3/02 |
主分类号 |
G03F7/039 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
