EXPOSURE METHOD OF PHOTOORESIST,申请号JP19750101212-传众专利搜索

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发明名称	EXPOSURE METHOD OF PHOTOORESIST
摘要	PURPOSE:To prevent the generation of halation due to the reflected light, by means of realizing the improved state of the sensitivity by heating the photo-resist layer.
申请公布号	JPS5225576(A)	申请公布日期	1977.02.25
申请号	JP19750101212	申请日期	1975.08.22
申请人	HITACHI LTD	发明人	TAKAYANAGI TOSHIHIKO
分类号	H01L21/027;G03F7/20	主分类号	H01L21/027
代理机构		代理人
主权项
地址

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