| 摘要 |
A machine which processes discrete wafer-form items in a chamber is provided with a slot-form channel along which the items move between points inside and outside the chamber, a lateral opening exposing the channel from its side, exposed walls of the channel defining a sealing margin directed toward that opening. A resilient sealing member is movable through the opening between an open position, in which the channel is not obstructed, and a sealing position, in which the sealing member resiliently engages the sealing margin. The machine shown is an ion implanter in which a beam of ions strikes the exposed item in the chamber. Features include a channel which makes an angle with the horizontal for gravity movement of the items; the sealing member serving as a stop to position an item along the length of the channel; and a plurality of openings and associated sealing members to provide locks on the sides of the chamber. The sealing member, preferably of cylindrical form, comprises an elongated resilient element disposed in the direction of the width of the slot and having a corresponding dimension greater than the thickness of the slot.
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