发明名称 Control of charged particle machining of substrate - is particularly for thickness control and uses substrate resonant frequency
摘要 <p>A control system is for machining substrates, particularly piezo-electric substrates used as high frequency resonators, the machinining being achieved by ionic bombardment. Control of the ion beam is derived from a comparison of the resonant frequency of the substrate and a reference frequency, such that when the two frequencies match, the substrate thickness required has been achieved and machining stops. The control technique is particularly applicable to substrates intended to work in the 40 MHz to 500 MHz band. The substrate carries electrodes on both its faces leaving the central area free for bombardment, the electrodes transmitting the frequency generated during the process to detection and control circuits.</p>
申请公布号 FR2319242(A1) 申请公布日期 1977.02.18
申请号 FR19750023337 申请日期 1975.07.25
申请人 THOMSON CSF 发明人 GERARD COUSSOT ET ARMAND SOUFACHE
分类号 H01L41/22;H03H3/02;(IPC1-7):03H3/04;01L41/22 主分类号 H01L41/22
代理机构 代理人
主权项
地址