发明名称 HEAT DEVELOPABLE PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain an image having low fog and less liable to the rise of fog and a change in sensitivity in preservation before exposure and to obtain an image having high Dmax and optimum for use in a photomechanical process by forming an image forming layer containing photosensitive silver halide spectrally sensitized in a specified wavelength range and incorporating a specified compound on the side with the image forming layer. SOLUTION: In a heat developable photosensitive material having a nonphotosensitive silver salt, photosensitive silver halide and a binder on the substrate, the photosensitive silver halide is spectrally sensitized in the range of 750-1,400 nm and at least one compound of the formula is contained on the side of the substrate with the photosensitive silver halide. In the formula, Z1 and Z2 are each halogen, X1 is H or an electron withdrawing group, Y1 is -CO- or -SO2-, Q is arylene or a divalent heterocyclic group, L is a divalent combining group, W is carboxyl, its salt, sulfo, its salt or the like and (n) is 0 or 1.
申请公布号 JP2000284408(A) 申请公布日期 2000.10.13
申请号 JP19990088496 申请日期 1999.03.30
申请人 FUJI PHOTO FILM CO LTD 发明人 GOTO TAKAHIRO
分类号 G03C1/498;(IPC1-7):G03C1/498 主分类号 G03C1/498
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