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发明名称
FINE PROCESSING METHOD
摘要
PURPOSE:To obtain a high resolution mask by a dry process by irradiating an energy beam on metallic halogen compound type film, by removing the portion irradiated and by processing a fine pattern on the film.
申请公布号
JPS5215267(A)
申请公布日期
1977.02.04
申请号
JP19750091127
申请日期
1975.07.28
申请人
HITACHI LTD
发明人
KOBAYASHI KEISUKE;KATOU YOSHIKI;YONEZAWA SHIGEJI
分类号
B23K26/18;H01L21/28;H01L21/302;H01L21/3205
主分类号
B23K26/18
代理机构
代理人
主权项
地址
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