PLASMA PROCESSOR AND METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To improve the distribution of a plasma generated by a high frequency electromagnetic field. SOLUTION: The plasma processor uses a slot antenna 30 for radiating an electromagnetic field in a process chamber 11 from a plurality of slots 34 on a radiation surface 31. The slot antenna 30 radiates the electromagnetic field in a direction inclined to the normal Z on its radiation surface 31.